Applications of SEM techniques of microcharacterization have proliferated to cover every type of material and virtually every branch of science and technology. This book emphasizes the fundamental physical principles. The first section deals with the foundation of microcharacterization in electron beam instruments and the second deals with the interpretation of the information obtained in the main operating modes of a scanning electron microscope.
This book has its origins in the intensive short courses on scanning elec tron microscopy and x-ray microanalysis which have been taught annually at Lehigh University since 1972.
Anderson–Hasler X-Ray Range By fitting Eq.(6.11) to experimental data, Anderson and Hasler (1966) evaluated the constants K and n, obtaining an analytical expression for the x-ray range useful for most elements: Rx = 0.064 ρ ( E 1.68 0 ...
The main objective of this book is to systematically describe the basic principles of the most widely used techniques for the analysis of physical, structural, and compositional properties of solids with a spatial resolution of approxi ...
Among the various SEM modes, the most routinely used in practice is secondary electron imaging (SEI) for characterizing ... (For more details on microcharacterization of semiconductors using various SEM modes, see Holt and Joy, 1989, ...
D. B. Holt and B. G. Yacobi, Cathodoluminescence characterization of semiconductors, Chapter 8, in SEM Microcharacterization of Semiconductors, ed., D. B. Holt and D. C. Joy, Published by Academic Press (1989). 15.
The present workbook provides a series of fundamental experiments to aid in "hands-on" learning of the use of the instrumentation and the techniques. It is written by a group of eminently qualified scientists and educators.
This book features reviews by leading experts on the methods and applications of modern forms of microscopy.
This Handbook is a complete guide to preparing a wide variety of specimens for the scanning electron microscope and x-ray microanalyzers.
The remote electron beam induced current analysis of grain boundaries in semiconducting and semi-insulating materials. Scanning, 21, 28À51. Holt, D.B. and Joy, D.C. (eds.) (1989). SEM Microcharacterization of Semiconductors.
Practical Scanning Electron Microscopy (Plenum, New York, 1975). Heinrich, K. F. J. Electron Beam X-ray Microanalysis (Van Nostrand, New York, 1981). Holt, D. B., and Joy, D.C. (Editors). SEM Microcharacterization of Semiconductors ...