Advances in Imaging and Electron Physics, Volume 207, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. Contains contributions from leading authorities on the subject matter Informs and updates on the latest developments in the field of imaging and electron physics Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing
This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave ...
Proceedings of the Institute of Physics Electron Microscopy and Analysis Group and Royal Microscopical Society ... EMAG 1999. Electron Microscopy and Analysis 1999. Proceedings of EMAG 99, University of Sheffield, 25–27 August 1999 ...
The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave ...
V. MACKAY–NEAL CODES MacKay–Neal (MN) codes were introduced in 1995 as a variation on Gallager codes. As in the case of Gallager codes (see Section IV), MN codes are defined by two very sparse matrices, but with the difference that ...
This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave ...
In the present volume, we have brought together the principal contributors, instrument designers and microscopists to discuss this topic in depth.
This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave ...
The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave ...
The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave ...
This thematic volume is on the topic of "Field-emission Source Mechanisms" and is authored by Kevin Jensen, Naval Research Laboratory, Washington, DC.