It is now routine to design and prepare semiconductor multilayers one atomic layer at a time, with independent control over the doping and composition approaching atomic-scale resolution in each layer. In turn, these multilayers can be patterned with features that are as small as only a few atomic layers in lateral extent. These resulting structures not only have led to new generations of electronic and optoelectronic devices offering superior performance, but also have opened up many new areas of exciting solid state and quantum physics. This book collates the whole of semiconductor science and technology relating to semiconductor multilayers since 1970, and points the way towards the ultimate of materials engineering - the design and preparation of solids atom by atom. Materials, technology, physics, and device issues are covered in detail, making this work ideal for physicists, electronic engineers, and materials scientists alike.
[19] B. Fang; H. Xu; T. He; H. Luo; Z. Yin J. Am. Ceram. Soc. 2004, 77, 991. [20] S. Shimanuki; S. Saito; Y. Yamashita Jpn. J. Appl. Phys. 1998, 57, 3382. [21] K. Harada; Y. Hosono; S. Saitoh; Y. Yamashita Jpn. J. Appl. Phys.
[ 5 ] Novak , J. P .; Brousseau , F. W .; Vance , R. C .; Johnson , B. J .; Lemon , J. T .; Hupp , D. I .; Feldheim , J. J. Am . Chem . Soc . 2000 , 122 , 12029-12030 ; Kim , J. Y .; Yoon , S. B .; Yu , J.-S. Chem . Commun .
[7] Akoi, M.; Yamane, H.; Shimada, M.; Sekiguchi, T.; Hanada, T.; Yao, T.; Sarayama, S.; DiSalvo, F. J. J. Cryst. ... [12] Schowalter, L. J.; Rojo, J. C.; Yakolev, N.; Shusterman, Yu.; Kovidenko, K.; Wang, R.; Bhat, L; Slack, G. A. Mat.
[5] Sasaki, T.; Mori, Y.; Yoshimura, M.; Yap, Y. K.; Kamimura, T. Mater. Sci. Eng., R 2000, 30, 1-54. [6] Zhang, K. C.; Wang, X. M. Material ... [8] Chen, C. T.; Yu, L. H. In Science and Technology of Crystal Growth; Zhang, K. C.; ...
Handbook of Crystal Growth: Fundamentals. Thermodynamics and kinetics
Electron Devices , 48 , 2043 ( 2001 ) . ... [ 11 ] A. Poyai , E. Simoen , C. Claeys , R. Rooyackers and A. Redolfi , in Microelectronics Technology and Devices – SBMicro 2002 , N.I. Morimoto , R.P. Ribas , and P. Verdonck , Editors , PV ...
Lett., 31, 1201 (1995). 3. http://www.soitec.com/. 4. A. Y. Usenko, A. G. Ulyashin, Jpn. J. Appl. Phys. 41, 5021 (2002). 5. R. Job, in Microelectronics Technology and Devices (SBMicro 2005), C. L. Claeys, J. W. Swart, N. I. Morimoto, ...
High Purity Silicon: Proceedings of the ... International Symposium
Handbook of Crystal Growth
Numerical Treatment of a Linear Model of Crystal Growth in a Vertical Bridgman Device