Process Control details the core knowledge and practical skills that a successful process control practitioner needs. It explains the essential technologies that are in use in current industrial practice or which may be wanting for the future. The book focuses on practical considerations, not only on those that make a control solution work, but also on those that prevent it from failing, especially for complex control loops and plant-wide control solutions. After discussing the indispensable role of control in modern process industries, the authors concentrate on the skills required for process analysis, control design, and troubleshooting. One of the first books to provide a systematic approach and structured methodology for process analysis and control design, Process Control illustrates that methodology with many practical examples that cover process control, equipment control, and control calculations derived from real projects and applications. The book uses 229 drawings and 83 tables to make the concepts it presents more intuitive and its methodology easy to follow. Process Control will help the practising control engineer to benefit from a wealth of practical experience and good ideas on how to make control work in the real world and students training to take up roles in process control are shown the applied relevance of control theory in the efficient functioning of industrial plant and the considerations needed to make it work. Advances in Industrial Control reports and encourages the transfer of technology in control engineering. The rapid development of control technology has an impact on all areas of the control discipline. The series offers an opportunity for researchers to present an extended exposition of new work in all aspects of industrial control.
In other more advanced control applications, a computer-based model of the process is used to compute the required MV and this is applied directly to the process as shown in Figure 1.16. Set point (r) Load (q) Feedforward model ...
Process Control for Practitioners: How to Tune PID Controllers and Optimize Control Loops
This text covers lithography process control at several levels, from fundamental through advanced topics.
This reference book can be read at different levels, making it a powerful source of information.
This book fills the gap between basic control configurations (Practical Process Control) and model predictive control (MPC).
They either address the wrong problems, or they keep beating on the same solutions, wondering why things don't improve. This is when you need an objective way to look at the problems. This is the time to get some data.
Process Control
Table 11.7 Reactor Mooney off-spec results over 14 production dates: Pareto analysis of reasons Tally Reasons for Mooney off-spec Frequency Percentage of total Cumulative percentage ...
Process-control Systems: Application, Design, Adjustment
The basic DMC approach is presented by Cutler and Ramaker ( 1980 ) . An early academic paper analyzing DMC is presented by Marchetti et al . ( 1983 ) . Garcia et al . ( 1989 ) review early theory and applications , while Morari and Lee ...